Industry Service Announcement
ESTECH 2008 offers something for everyone...
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No other venue offers such a diverse array of tutorials, seminars, Working Group meetings, exhibits, and networking events. Launch a new beginning to your professional career with the knowledge you’ll gain during ESTECH 2008!
Improve your professional skills by earning certificates in coursework, attending presentations on the latest research, and discovering products and services to increase efficiency.
Contamination Control Seminars
Monday, May 5 2008
8 – 10 a.m.
Surface Cleaning and Contamination Analysis
Chair: Gary Knoth
This session covers cleaning and analysis topics ranging from a study of the effectiveness of surface vacuum cleaning on a large range of particle sizes to the possible dissolving of filters by liquid CO2 in an automated CO2 cleaning system. Additional topics include wiper performance and plasma surface preparation for cleaning prior to a bonding process.
10 a.m. – 12 p.m.
Cleanroom Flame Retardant Garment Testing and Validation
Chair: Jan Eudy
Discussion of the development of flame retardant fiber and fabric for cleanroom FR garments and the manufacture and testing of cleanroom FR garments.
1:30 – 3:30 p.m.
Cleanroom Design, Construction, Housekeeping, Support
Chair: Roger Diener
Maintenance challenges in the operational cleanroom: Cleanroom renovations, maintenance, and housekeeping-related issues.
3:45 – 5:45 p.m.
USP 797
Chair: TBD
More information on this seminar will be available soon.
Tuesday, May 6
8 a.m. – 12 p.m.
Time Dependent Haze
Chair: Jim Ohlsen
Airborne molecular contaminants present at trace levels in controlled environments are the cause for molecular haze defects found on critical surfaces such as silicon wafers, photomasks, optics, and data storage disks. Industry TDH experts share their knowledge, experience, and understanding about haze defects and their impact on yield.
1:45 – 3:35 p.m.
Microbiology
Chair: Greg Mosley
This session will cover microbial monitoring methods for testing and qualifying controlled environments for medical product manufacturing. Recommendations for types, frequency, and levels of testing will be reviewed. In addition, the methods for microbial identification commonly employed will be discussed and compared with recommendations as to which methods are more appropriate in different situations.
4 – 6 p.m.
ESD
Chair: Larry Levit
Insulating materials, such as glass, quartz, G10, and Teflon, are often required in high-technology manufacturing. These materials become highly charged by normal handling, resulting in microcontamination, faulty robotic operation, and physical damage to parts or products. This seminar will discuss the effects of static electricity and how to minimize them.
Wednesday, May 7
8 a.m. – 12 p.m.
IEST Recommended Practices Update
Chair: TBD
See what is new with the RPs produced by IEST that assist professionals in a variety of CC applications.
1:30 – 3:30 p.m.
Cleanroom Design Secrets Revealed
Chair: Michael Jue
Successful design and operation of cleanrooms can sometimes be impaired or improved by simple, but overlooked, issues or concepts. This seminar will feature industry-leading speakers discussing basic to advanced techniques, case studies, and practical solutions being used in successful, high-performance cleanrooms. Their experience covers a number of industries including healthcare, pharmaceutical, biotech, aerospace, academic and research, nanotechnology, and semiconductor manufacturing. Attendees at all levels will gain exceptional exposure to practical concepts, techniques, and know-how from these cleanroom professionals.
Archived Press Releases:
IEST 2005 Contamination Control
